Z. Salmi, L. Koefoed, A. G. Čabo, P. Hofmann, S. U. Pedersen, K. Daasbjerg
Dept. of Chemistry Aarhus University, Denmark

Intercalation of tetraalkylammonium ions facilitates the delamination of graphene films, typically produced by chemical vapour deposition (CVD) on metals. Electrochemically induced intercalation is performed by applying a negative bias to the graphene-metal electrode in a solution of tetraalkylammonium ions. The presence of the ions between the metal electrode and the graphene layer lowers the interaction between them. In a previous article [1] the question was raised, if the defects detected in the graphene structure arose from the CVD or the subsequent delamination process. To this end electrochemistry and Raman spectroscopy were employed to follow the individual steps of the intercalation on three sets of samples, i.e. graphene deposited on iridium, platinum and copper. Here we will present the main results of this work and the possible applications of intercalated as well as delaminated graphene.

1. L. Koefoed et al. J. Phys. D: Appl. Phys., 2015, 48, pp 115306-115314.

Post-doctoral researcher at Aarhus University under the supervision of Kim Daasbjerg and Steen U. Pedersen with focus on delamination and surface analysis of CVD graphene monolayers. My main interests concern surface chemistry and surface analysis (mainly XPS). In 2013 I received my PhD degree from Paris Diderot University under the supervision of Mohamed Mhedi Chehimi. I then moved to the SPC lab (Créteil University) to study, during one year as a temporary assistant professor, the surface chemistry of HPLC columns for separation and catalysis.