Stephan Hofmann, Department of Engineering, University of Cambridge, United Kingdom
The commercial potential of graphene hinges on the development of growth and integration techniques that are scalable and allow an adequate level of structural control. Chemical vapor deposition (CVD) now dominates the carbon nanotube market and rapid progress is being made to develop it also for graphene manufacture. A key challenge thereby is to increase the level of structural growth selectivity and control. With a focus on diverse graphene applications in the electronics and display industry, we are developing process rationales that are informed by a fundamental understanding of the catalytic growth process. This talk will review our current understanding of graphene CVD based on model catalyst systems, including results [1-5] from a range of in-situ characterization methods such as environmental scanning and transmission electron microscopy, high-pressure X-ray photoelectron spectroscopy, X-ray diffraction and scanning tunneling microscopy. The talk thereby will also outline current challenges in developing graphene as industrial device material.
1. Kidambi et al. Nano Lett. 13, 4769 (2013), 2. Weatherup et al. Nano Lett. 11, 4154 (2011), 3.Weatherup et al. Nano Lett 13, 4624 (2013), 4. Patera et al. ACS Nano 7, 7901 (2013), 5. Weatherup et al. ACS Nano 6, 9996 (2012).